09:00 |
Registration |
10:00 |
Welcome Address
G. Sextl, Fraunhofer ISC, Würzburg/D
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Chemistry, Materials and Processes for Electronics
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Chairs: P. Kirsch, Merck KGaA, Darmstadt/D
D. Scheschkewitz, Universität Saarland, Saarbrücken/D |
10:10 |
Plenary Lecture
Atomic layer deposition: From molecules to solids, structures and devices
J. Bachmann¹ ¹ Universität Erlangen-Nürnberg, Erlangen/D |
10:55 |
Nano-films in microchip metallization not easy to deal with
D. Mayer¹ ¹ BASF SE, Ludwigshafen/D |
11:25 |
Lunch Break and Poster Viewing
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12:00 |
High performance Si-based nanopowders for energy storage applications
J. Lyubina¹ ¹ Evonik Resource Efficiency GmbH, Hanau/D |
12:30 |
Tandem-lecture
New industrially applicable syntheses to organometallic vapor deposition precursors - an academic/industrial approach
R. Karch¹; J. Sundermeyer² ¹ Umicore AG & Co. KG, Hanau/D; ² Philipps-Universität Marburg/D |
13:15 |
Coffee Break and Poster Viewing
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Advanced Characterization Methods
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Chairs: F. Menzel, Evonik Industries AG, Hanau/D K. Schierle-Arndt, BASF SE, Ludwigshafen/D
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14:45 |
In-situ X-ray powder diffraction investigations during reactions between solid and gas phase
B. Albert¹ ¹ TU Darmstadt/D |
15:15 |
Novel in-situ electron microscopy solutions: capabilities and applications
M. Mosig¹ ¹ Protochips, Morrisville, NC/USA |
15:45 |
Emission monitoring during laser remote processing
E. Schade¹; C. Schult¹; G. Mäder¹; M. Wöllner²; A. Klotzbach¹; S. Kaskel² ¹ Fraunhofer IWS, Dresden/D; ² TU Dresden, Fraunhofer IWS, Dresden/D |
16:05 |
Coffee Break and Poster Viewing
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16:35 |
Inorganic artificial leafs for photoelectrochemical H2 production: surface and interface science issues
W. Jägermann¹ ¹ TU Darmstadt/D |
17:05 |
Special Lecture
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Chair: K. Schierle-Arndt, BASF SE, Ludwigshafen/D |
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Brexit – A „How to“-Guide A. Meister1
1 Verband der Chemischen Industrie e.V., Frankfurt am Main/D
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17:35 |
Poster Party
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20:00 |
End of the First Day
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